Nanofabrication at APL: Novel Techniques to Deliver Innovative Devices

Abstract

The Johns Hopkins University Applied Physics Laboratory (APL) is working to realize a variety of nanostructured designs via top-down nanofabrication techniques. We leverage electron beam lithography, nanoimprint lithography, and focused ion beam deposition to pattern nanoscale features on semiconductor and optical material substrates. We combine these with other traditional microfabrication techniques as well as a few unique ones, including an atomic layer deposition–enabled nanomolding process to create high-aspect-ratio nanopillars from materials such as titanium dioxide (TiO2 ). We apply these techniques on a wide variety of nontraditional substrate and film materials, including optical, phase-change, and superconducting materials, to create novel optical and electronic devices.